wet benches and fume hoods

Machine for Si-wafers processing

Machine for Si-wafers processing

Is a space-saving device designed for cleaning and etching of the silicon wafers. Device Features: Used materials comply with the FM4910 standards Etching and rinsing bath. One to three storage positions. Fully automated; Automatic transport of the Si-wafers to the...

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Ingot cleaning line

Ingot cleaning line

The automatic equipment is used to etch and clean monocrystalline silicon ingots in the semiconductors manufacturing. Individual ingots of cylindrical shape are placed in a basket on the incoming conveyor belt. Having the cover of the incoming conveyor belt been...

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Manual Cleaning Line for Wafers Etching

Manual Cleaning Line for Wafers Etching

The equipment is a chemical box to clean and etch monocrystal silicon wafers in the chemical SC-1 and in hydrofluoric acid. The operator places baskets with silicon wafers of diameter equal to 4 up to 8“ into individual tubs. Having the required etching time been...

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Chemical Boxes AWAP For HF Mixtures

Chemical Boxes AWAP For HF Mixtures

The equipment is designed to etch Si plates in manufacture of semiconductors. It is designed as a stand-alone chemical box. The etching is done by means of chemicals based on hydrofluoric acid. All materials used are chemically resistant and they meet the requirements...

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Automatic Box for Microstrip

Automatic Box for Microstrip

The machine is designed as a single-purpose automatic box to etch Si plates. The cycle of etching and rinsing the Si plates is fully automatic according to the selected parameters, the operator only replenishes the incoming material, takes products and selects the...

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Automatic Line for Etching Chips

Automatic Line for Etching Chips

The equipment is a set of four chemical sections interconnected in a manufacturing line. The line makes it possible to carry out an automatic comprehensive chemical procedure on wafers from monocrystalline silicon. The procedure typically consists of etching sequences...

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A machine to etch facets of wafers in a column

A machine to etch facets of wafers in a column

The machine is used to etch facets of semiconductor wafers (up do the diameter of 4“) with a mixture of nitric acid, hydrofluoric acid and acetic acid. After the etching process is over, the wafers are rinsed in a triple upstream cascade with demineralised water and...

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A hood for acids

A hood for acids

The equipment is used as laboratory box to work with aggressive chemicals. The main part is represented with a working area with a chemically resistant polypropylene worktop and with illumination. The worktop contains three sinks, each is connected to an independent...

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Degreasing drying machine

Degreasing drying machine

The machine is designed for degreasing and drying of aluminium foils in semiconductor industry. Degreasing is done in several baths with toluene acetone and ethanol with support of ultrasound for increased efficiency of the cleaning. At the end of the process the...

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Tube etching line

Tube etching line

Compact device designed for etching of the quartz (silica glass) tubes in a hydrofluoric acid and subsequent washing in a demi-water. Device Features: Processed tube diameter up to 300mm and tube length up to 2450mm Built-in sprays (washing system) Workplace...

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Box for Washing Canisters and Shipping Boxes

Box for Washing Canisters and Shipping Boxes

The device is designed to wash the canisters and shipping boxes from Spraying chemicals DI water from the inner and outer parts. The equipment is used for the needs of the semiconductor industry. Skeleton device is made of white polypropylene. (The equipment is used...

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Jet etching machine

Jet etching machine

The machine is designed for etching of the edges of the silicon wafers and following proceses of rinsing and drying. Etching and rinsing is done by jets with optional position and angle to the wafer. After manual insertion the wafers are automatically centered on the...

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Automatic Tube Etching Machine

Automatic Tube Etching Machine

The device is designed for cleaning and washing of the semiconductor tubes and other small parts in the semiconductor industry. You can etch into the tube diameter of 300 mm and a length of 1450-2765 mm. Manipulator situates tube on a rotating cylinders (roller beam)....

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Cleaning and Etching of the Sapphire Wafers

Cleaning and Etching of the Sapphire Wafers

The equipment is designed for use in the optoelectronic industry and to operate in clean rooms. Chemical cabinet is used for washing and etching sapphire wafers by chemical solutions in the baths. A diameter of the wafer can be 2"- 8". Wafers are stored in PFA...

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Ingot etching line

Ingot etching line

Designed for fully automatic cleaning of silicon monocrystals. Device Features: Processing of one or two ingots with a total weight up to 30 kg Input and output conveyor with handling baskets, two-axis manipulator Barcode reader of a loaded batch Three process baths:...

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Chemical line for etching silicon wafers

Chemical line for etching silicon wafers

The equipment is used for an automatic process of etching and cleaning small Si-wafers for research tasks in various process chemicals. The operator will prepare loads of etching baths and will place the baskets with silicon substrates sized 2" in positions for...

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Acid Bench Etching

Acid Bench Etching

The equipment is an automatic chemical line designed for manufacture of semiconductors and is used for the technological process which consists in etching Si-wafers with a mixture of acids. The operator will place a basket with silicon substrates sized 8" into a...

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