A set of six identical chemical boxes to etch and wash silicon wafers of 150 – 200 mm in diameter under laboratory conditions. Tubs for chemical processes are manually operated, temperature of the PVDF tub is controllable. Rinse tubs are equipped with automatic quick dump mode.


> Six boxes
> The main structural material is represented by chemically resistant polypropylene
> Unitronics control system
> A transparent motorized front cover operated by push-buttons
> Manually operated tubs for chemical processes
> PVDF heated tub with temperature control
> Passive etching tubs
> Rinse tubs with an automatic quick dump mode
> Each box has the following dimensions: 2 000 × 1 200 × 2 200 mm