A set of chemical boxes for wet processes in processing of semiconductors by means of optical lithography. Each of the boxes has a specific function and arrangement of tubs, according to the intended use. Typically, etching tubs are made of chemically resistant PVDF with manual filling and can be equipped with heating, cooling, ultrasound and agitation by means of nitrogen. Rinse tubs are made of PP. The equipment is connected to distribution pipelines of nitrogen, vacuum and deionised water and to exhaust of air.
HIGHLIGHTS
- Electrically controlled front covers made of transparent PVC
- Different sets of tubs – etching, rinsing, ultrasonic, heated
- Collection of chemical waste in integrated collection containers
- Adjustable technological formulae
- Control of boxes by means of an industrial PLC via HMI touch screen
