Chemical Boxes AWAP For HF Mixtures


The equipment is designed to etch Si plates in manufacture of semiconductors. It is designed as a stand-alone chemical box. The etching is done by means of chemicals based on hydrofluoric acid. All materials used are chemically resistant and they meet the requirements of FM 4910 standard for the use in clean rooms. The box has two tubs and is equipped with a manipulator for two six-inch baskets or for one eight-inch basket. The cycle of etching and rinsing of the Si plates takes place automatically in the equipment according to the selected technological receipt.

(the equipment is used in Czech Republic by an US customer)