A set of six identical chemical boxes to etch and wash silicon wafers of 150 – 200 mm in diameter under laboratory conditions. Tubs for chemical processes are manually operated, temperature of the PVDF tub is controllable. Rinse tubs are equipped with automatic quick dump mode.
HIGHLIGHTS
> Six boxes
> The main structural material is represented by chemically resistant polypropylene
> Unitronics control system
> A transparent motorized front cover operated by push-buttons
> Manually operated tubs for chemical processes
> PVDF heated tub with temperature control
> Passive etching tubs
> Rinse tubs with an automatic quick dump mode
> Each box has the following dimensions: 2 000 × 1 200 × 2 200 mm